Experimental validation of novel mask technology to reduce mask 3D effects-Reference-Cited by-同舟云学术

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Experimental validation of novel mask technology to reduce mask 3D effects

Published:2015-10-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Van Look Lieve,Philipsen Vicky,Hendrickx Eric,Davydova Natalia,Wittebrood Friso,de Kruif Robert,van Oosten Anton,Miyazaki Junji,Fliervoet Timon,van Schoot Jan,Neumann Jens Timo

Publisher

SPIE

Reference18 articles.

1. Actinic characterization and modeling of the EUV mask stack;Philipsen,2013

2. Interaction of 3D mask effects and NA in EUV lithography;Neumann,2012

3. EUV lithography scanner for sub 8 nm resolution;Van Schoot,2015

4. Alternative EUV mask technology for Mask 3D effect compensation;Van Look,2014

5. Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging;Deng,2003

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