Assessment of contour modeling readiness for curvilinear masks-Reference-Cited by-同舟云学术

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Assessment of contour modeling readiness for curvilinear masks

Published:2022-12-01 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2022
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Author:

Yi Raewon,Lee Sukho,Choi Jin,Kim Eokbong,Lee Sanghee

Publisher

SPIE

Reference7 articles.

1. Manufacturing Challenges for Curvilinear Masks;Spence,2017

2. Comparing curvilinear vs Manhattan ILT shape efficacy on EPE and process window;Zhang,2016

3. Model-based MPC enables curvilinear ILT using either VSB or multi-beam mask writers;Pang,2017

4. Mask process simulation for mask quality improvement;Takahashi,2015

5. Calibration of e-beam and etch models using SEM images;Chuyeshov,2009

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC;Photomask Technology 2023;2023-11-21

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