Propagating surface plasmon polaritons in graphene under applied uniform strain

Abstract

In this work, we theoretically investigate the propagation length of plasmon waves in graphene layer under uniform strain surrounded by two dielectric media of dielectric constants ε1 and ε2, respectively. The plasmon losses (plasmon damping), plasmon propagation length and the penetration depth of the electric field associates with the charge fluctuations can be controlled by varying the direction and the strength of the applied strain and the direction of the plasmon wave propagation with respect to the direction of the applied strain. Because strain induces anisotropy in graphene optical conductivity, the strain-dependent orientation plays an important role to manipulate the direction and variations of the graphene plasmon energy, which may be useful to tune graphene properties in plasmonic devices to enhance light-matter interaction.