Plasma enhanced metal‐organic chemical vapor deposition of aluminum oxide dielectric film for device applications
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332725
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1. Generation of interface states in MOS systems
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3. Radiation resistance of Al2O3MOS devices
4. Aluminum Oxide/Silicon Dioxide, Double-Insulator, MOS Structure
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