Current-conduction and charge trapping properties due to bulk nitrogen in HfOxNy gate dielectric of metal-oxide-semiconductor devices
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1935768
Reference17 articles.
1. Materials characterization of ZrO2–SiO2 and HfO2–SiO2 binary oxides deposited by chemical solution deposition
2. Effect of Hf metal predeposition on the properties of sputtered HfO2/Hf stacked gate dielectrics
3. The Electrical and Material Characterization of Hafnium Oxynitride Gate Dielectrics With TaN-Gate Electrode
4. Electrical properties and thermal stability of CVD HfOxNy gate dielectric with poly-Si gate electrode
5. Application of HfSiON as a gate dielectric material
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1. Electrical and Optical Characteristics of SSI-LED Made from Capacitor Containing Tri-Layer WOx Embedded Zr-Doped HfOx Gate Dielectric;ECS Journal of Solid State Science and Technology;2021-12-01
2. Effect of Nitrogen Content in Tunneling Dielectric on Cell Properties of 3-D NAND Flash Cells;IEEE Electron Device Letters;2019-05
3. Light Emission Enhancement by Embedding Nanocrystalline Cadmium Selenide in Amorphous ZrHfO High-k Dielectric Thin Film Deposited on Silicon Wafer;ECS Journal of Solid State Science and Technology;2015-12-23
4. Improving dielectric properties of epitaxial Gd2O3 thin films on silicon by nitrogen doping;Applied Physics Letters;2013-01-14
5. Charge Trapping of HfLaTaON-Gated Metal-Oxide-Semiconductor Capacitors with Various Tantalum Concentrations;Electrochemical and Solid-State Letters;2011
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