Dielectric properties of Pr2O3 high-k films grown by metalorganic chemical vapor deposition on silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1580633
Reference14 articles.
1. The electronic structure at the atomic scale of ultrathin gate oxides
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5. The Binary Rare Earth Oxides
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