Oblique angle deposition of boron carbide films by magnetron sputtering-Reference-Cited by-同舟云学术

Oblique angle deposition of boron carbide films by magnetron sputtering

Published:2021-09-28 Issue:12 Volume:130 Page:125305
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Shin S. J.¹^ORCID,Bayu Aji L. B.¹^ORCID,Bae J. H.²,Engwall A. M.¹^ORCID,Nielsen M. H.¹,Hammons J. A.¹^ORCID,Zuo X. B.³^ORCID,Lee B.³^ORCID,Lepro X.¹^ORCID,Mirkarimi P. B.¹^ORCID,Kucheyev S. O.¹

Affiliation:

1. Lawrence Livermore National Laboratory, Livermore, California 94550, USA

2. General Atomics, San Diego, California 92186, USA

3. X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, USA

Funder

Lawrence Livermore National Laboratory

General Atomics

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/am-pdf/10.1063/5.0056849

Reference50 articles.

1. Boron carbide—A comprehensive review

2. Reduction of stress and roughness by reactive sputtering in W/B 4 C multilayer films

3. Optical constants of magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV

4. Stress, Roughness and Reflectivity Properties of Sputter-Deposited B4C Coatings for X-Ray Mirrors*

5. B4C thin films for neutron detection

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