Arsenic‐implanted Si layers annealed using a cw Xe arc lamp
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.92205
Reference13 articles.
1. Laser annealing of boron‐implanted silicon
2. A laser‐scanning apparatus for annealing of ion‐implantation damage in semiconductors
3. Pulsed‐electron‐beam annealing of ion‐implantation damage
4. Electron-beam annealing of ion-implanted silicon
5. Annealing of ion‐implanted silicon by an incoherent light pulse
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1. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals;Rapid Thermal Processing of Semiconductors;1997
2. Transient annealing of semiconductors by laser, electron beam and radiant heating techniques;Reports on Progress in Physics;1985-08-01
3. Mobility and carrier density of rapid isothermally annealed antimony implanted (100) and (111) silicon;Journal of Applied Physics;1985-04-15
4. Rapid Thermal Processing: A Bibliography;MRS Proceedings;1985
5. Rapid annealing of titanium silicide using a graphite strip heater;Journal of Applied Physics;1984-12-15
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