An electron impact cross section set for CHF3
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1289076
Reference16 articles.
1. Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor
2. Ion and neutral species in C2F6 and CHF3 dielectric etch discharges
3. Characteristics of Fluorocarbon Radicals andCHF3Molecule inCHF3Electron Cyclotron Resonance Downstream Plasma
4. Electron Interactions with CHF3
5. Electron Interactions With Plasma Processing Gases: An Update for CF4, CHF3, C2F6, and C3F8
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