Stitching interferometry for ellipsoidal x-ray mirrors-Reference-Cited by-同舟云学术

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Stitching interferometry for ellipsoidal x-ray mirrors

Published:2016-05 Issue:5 Volume:87 Page:051905
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Yumoto Hirokatsu¹,Koyama Takahisa¹^ORCID,Matsuyama Satoshi²,Yamauchi Kazuto²,Ohashi Haruhiko¹³

Affiliation:

1. Japan Synchrotron Radiation Research Institute/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan

2. Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

3. RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan

Funder

Japan Society for the Promotion of Science (JSPS)

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4950714

Reference18 articles.

1. Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining

2. Short focal length Kirkpatrick-Baez mirrors for a hard x-ray nanoprobe

3. Removal rate model for magnetorheological finishing of glass

4. Ultra-precision surface finishing by ion beam and plasma jet techniques—status and outlook

5. Breaking the 10 nm barrier in hard-X-ray focusing

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Alignment aberrations compensation for near-cylinder surface stitching interferometry with near-null Computer-Generated Hologram based on Legendre-Fourier polynomials;Measurement;2024-08

2. Two-step retrace error calibration removing tilt ambiguity in coherence scanning interferometry;Optics Letters;2024-01-24

3. Effect Of Pixel Size and Lateral Distortion On The Accuracy of Stitching Interferometry For High Precision X-Ray Mirrors;2024

4. Multidimensional stitching method with wavelength tuned interferometry and unconstrained support tooling for large-thin parallel plate;Optics Express;2023-11-21

5. Towards new generation long trace profiler LTP-2020: system design with different sensors in different operation modes;Advances in Metrology for X-Ray and EUV Optics X;2023-10-03

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