Through-membrane electron-beam lithography for ultrathin membrane applications
Author:
Affiliation:
1. Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands
2. Else Kooi Laboratory, Delft University of Technology, Delft 2628CT, the Netherlands
Funder
European Union's Horizon 2020
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4986991
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