Laser emission at 428 nm in N2+: Competition between two- and three-level amplification

Author:

Danylo R.1ORCID,Zhang X.12ORCID,Lisova A.13,Houard A.1ORCID,Liu Y.24ORCID,Tikhonchuk V.56ORCID,Mysyrowicz A.1ORCID

Affiliation:

1. Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris 1 , 828 Boulevard des Maréchaux, Palaiseau Cedex 91762, France

2. Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology 2 , 516 Jungong Road, Shanghai 200093, China

3. Faculty of Physics, Taras Shevchenko National University of Kyiv 3 , 64 Volodymyrska str., Kyiv 01601, Ukraine

4. CAS Center for Excellence in Ultra-Intense Laser Science 4 , Shanghai 201800, China

5. Centre Lasers Intenses et Applications, University of Bordeaux-CNRS-CEA 5 , 351 Cours de la Liberation, Talence Cedex 33405, France

6. Extreme Light Infrastructure ERIC, ELI-Beamlines Facility 6 , Dolní Břežany 25241, Czech Republic

Abstract

Lasing of N2+ at 428 nm is studied as a function of the delay dt between two 800 nm ultrashort pumping pulses from a Ti:sapphire laser. This lasing corresponds to a population-inverted transition between levels B2Σu+(0) and X2Σg+(1) of a singly ionized nitrogen molecule. An important erasing of laser emission is observed under pumping with two consecutive pulses separated by large delays −20 ps < dt < +20 ps. From an analysis of the quenching results, we conclude that the mechanism of lasing corresponds to a coherent two-photon amplification scheme. Our results show that a two-photon process can dominate over a population-inverted one-photon amplification.

Funder

Direction Générale de l'Armement

China Scholarship Council

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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