Load sensitive stable current source for complex precision pulsed electroplating-Reference-Cited by-同舟云学术

Load sensitive stable current source for complex precision pulsed electroplating

Published:2019-10-01 Issue:10 Volume:90 Page:104704
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Nassar Omar¹^ORCID,Meissner Markus V.¹,Wadhwa Sagar¹,Korvink Jan G.¹^ORCID,Mager Dario¹

Affiliation:

1. Institute of Microstructure Technology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Funder

Deutsche Forschungsgemeinschaft

H2020 Future and Emerging Technologies

H2020 European Research Council

Deutscher Akademischer Austauschdienst

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5113790

Reference60 articles.

1. Electrodeposited Nanocrystalline Metals, Alloys, and Composites

2. Introduction to Microfabrication

3. Ink-jet printing technology enables self-aligned mould patterning for electroplating in a single step

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