Nanostructuring in Ge by self-ion implantation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3372757
Reference19 articles.
1. Ion beams in silicon processing and characterization
2. Engineering of nanostructured carbon materials with electron or ion beams
3. The effects of self‐ion bombardment (30–500 keV) on the surface topography of single‐crystal germanium
4. Self-ion-induced swelling of germanium
5. Ion implantation damage and annealing in germanium
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