At‐wavelength metrology of 13 nm lithography imaging optics-Reference-Cited by-同舟云学术

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At‐wavelength metrology of 13 nm lithography imaging optics

Published:1995-02 Issue:2 Volume:66 Page:2241-2243
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Tan Zhengquan,MacDowell A. A.,La Fontaine B.,Bjorkholm J. E.,Tennant D.,Taylor D.,Himel M.,Freeman R. R.,Waskiewicz W. K.,Windt D. L.,Spector S.,Ray‐Chaudhuri A. K.,Stulen R. H.,Ng W.,Cerrina F.

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1145718

Reference6 articles.

1. Soft x-ray reduction lithography using multilayer mirrors

2. Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm

3. Appl. Opt. 32, (1993).APOPAI0003-6935

4. X-ray imaging at the diffraction limit

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Applicability of the Van Cittert–Zernike theorem in a Ronchi shearing interferometer;Applied Optics;2022-02-15

2. Applications of wavefront division interferometers in soft x rays;Review of Scientific Instruments;1995-02

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