Experimental scaling law for mass ablation rate from a Sn plasma generated by a 1064 nm laser
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3190537
Reference18 articles.
1. Extreme ultraviolet lithography: Status and prospects
2. Extreme ultraviolet lithography
3. Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography
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