Laser Scattering: a Fast, Sensitive, In-Line Technique for Advanced Process Development and Monitoring-Reference-Cited by-同舟云学术

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Laser Scattering: a Fast, Sensitive, In-Line Technique for Advanced Process Development and Monitoring

Published:2007 Issue: Volume: Page:
ISSN:0094-243X
Container-title:AIP Conference Proceedings
language:
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Author:

Nolot E.,Arrazat B.,Favier S.,Borde Y.,Damlencourt J. F.,Vincent B.,Kermarrec O.,Carron V.,Nemouchi F.,Vandelle P.,Bogumilowicz Y.,Danel A.,Seiler David G.,Diebold Alain C.,McDonald Robert,Garner C. Michael,Herr Dan,Khosla Rajinder P.,Secula Erik M.

Publisher

AIP

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-speed wafer surface defect detection with edge enhancement via optical spatial filtering in serial time-encoded imaging;Optics & Laser Technology;2025-01

2. Dark-field surface defects detection method for multi-surface-shape large aperture optical components;Applied Optics;2024-08-27

3. Elliptical polarization characterization of scattered light in dark field defect inspection technology;3rd International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2023);2023-08-17

4. Structural Design and Simulation of a Multi-Channel and Dual Working Condition Wafer Defect Inspection Prototype;Micromachines;2023-08-07

5. Spot-scanning laser scattering system for defects detection of wafer surface;Thirteenth International Conference on Information Optics and Photonics (CIOP 2022);2022-12-15

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