Downstream plasma transport and metal ionization in a high-powered pulsed-plasma magnetron
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4878622
Reference42 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities
2. Ionized physical vapor deposition (IPVD): A review of technology and applications
3. High power pulsed magnetron sputtering: Fundamentals and applications
4. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
5. High power impulse magnetron sputtering discharge
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