Reactive ZnO/Ti/ZnO interfaces studied by hard x-ray photoelectron spectroscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4854636
Reference27 articles.
1. Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-ZnO
2. A comprehensive review of ZnO materials and devices
3. High-throughput optimization of adhesion in multilayers by superlayer gradients
4. Ti∕Au n-type Ohmic contacts to bulk ZnO substrates
5. Ti∕Au Ohmic Contacts to Al-Doped n-ZnO Grown by Pulsed Laser Deposition
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