Enhancement of 2D topological semimetal transport properties by current annealing

Author:

Fereidouni A.12ORCID,Doha M. H.1,Pandey K.3,Basnet R.1,Hu J.123ORCID,Churchill H. O. H.123ORCID

Affiliation:

1. Department of Physics, University of Arkansas, Fayetteville, Arkansas 72701, USA

2. MonArk NSF Quantum Foundry, University of Arkansas, Fayetteville, Arkansas 72701, USA

3. Materials Science and Engineering Program, Institute for Nanoscience and Engineering, University of Arkansas, Fayetteville, Arkansas 72701, USA

Abstract

Observation of intrinsic quantum transport properties of two-dimensional (2D) topological semimetals can be challenging due to suppression of high mobility caused by extrinsic factors introduced during fabrication. We demonstrate current annealing as a method to substantially improve electronic transport properties of 2D topological semimetal flakes. Contact resistance and resistivity were improved by factors up to [Formula: see text] and [Formula: see text], respectively, in devices based on exfoliated flakes of two topological semimetals, ZrSiSe and BaMnSb2. Using this method, carrier mobility in ZrSiSe was improved by a factor of 3800, resulting in observation of record-high mobility for exfoliated ZrSiSe. Quantum oscillations in annealed ZrSiSe appeared at magnetic fields as low as 5 T, and magnetoresistance increased by a factor of 104. We argue that a thermal process underlies this improvement. Finally, Raman spectroscopy and analysis of quantum oscillations in ZrSiSe indicate that the phonon modes and Fermi surface area are unchanged by current annealing.

Funder

U.S. Department of Energy

National Science Foundation

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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