Effect of surface modification by Ar+ ion irradiation on thermal hysteresis of VO2

Author:

Nishikawa K.1ORCID,Takakura S.23ORCID,Nakatake M.2ORCID,Yoshimura M.1ORCID,Watanabe Y.1ORCID

Affiliation:

1. Toyota Technological Institute 1 , 2-12-1 Hisakata, Tempaku, Nagoya 468-8511, Japan

2. Aichi Synchrotron Radiation Center, Aichi Science and Technology Foundation 2 , Seto, Aichi 489-0965, Japan

3. Synchrotron Radiation Research Center, Nagoya University 3 , Furo-cho, Chikusa, Nagoya 464-8603, Japan

Abstract

Vanadium dioxide (VO2) undergoes a metal–insulator phase transition at ∼70 °C. As this is a first-order phase transition, VO2 exhibits thermal hysteresis. The reflectivity and electrical resistivity of VO2 drastically change at insulator-to-metal (TIMT) and metal-to-insulator (TMIT) transition temperatures during heating and cooling, respectively. For smart glass and thermal memory applications employing VO2, the origin and control factor of thermal hysteresis must be investigated. Additional elemental doping and nano-structuring of VO2 affect the thermal hysteresis width. However, the factors determining TIMT and TMIT remain unclear. TIMT and TMIT can be modified by irradiating Ar+ on the surface of VO2 nanostructures with varying Ar+ irradiation doses (nAr+) at 1 keV. The temperature-dependent reflectivity against IR light is evaluated. For VO2, TIMT decreases with nAr+ = 3.9 × 1014 cm−2; TMIT increases with nAr+ > 3.9 × 1015 cm−2. Ar+ irradiation decreases the thermal hysteresis width. Because the expected penetration depth of Ar+ at 1 keV into the VO2 surface is <6 nm, the VO2 chemical state at the outermost surface is investigated using x-ray absorption spectroscopy with soft x-ray irradiation. The V L-edge peak energy decreases with increasing nAr+ . Ar+ irradiation reduces V only at the outermost surface state. TIMT is more sensitive than TMIT to the reduction of V. The reduction of only a small fraction at the surface affects the phase transition of the entire VO2. These results are beneficial for understanding the cause of thermal hysteresis width and improving the performance of devices using VO2.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3