The kinetic theory of prompt redeposition in the case of thin Debye sheath

Abstract

Prompt redeposition is a process in which a neutral atom sputtered from a divertor target or the first wall of a tokamak returns on the surface right after ionization, before experiencing any collisions with the background plasma. This paper presents analytical solutions of kinetic equations for sputtered neutrals and resulting ions. Using obtained distribution functions, the redeposition coefficient and average impact angle are derived under assumptions of thin Debye sheath. Our expression for the prompt redeposition coefficient explicitly depends on the angular and energy distributions of sputtered atoms and, therefore, is more universal than often used Fussmann equation valid only for cosine distribution. The effect of the angular distributions of sputtered particles on the prompt redeposition efficiency and parameters of redeposited ions is analyzed.