Characterization of dielectric diffraction gratings on multilayer structures by spectroscopic ellipsometry

Abstract

Gratings are widely used for coupling into and out of evanescent and propagating electromagnetic modes, which are otherwise not accessible due to their large in-plane wave vector. A precise description of the optical response requires the knowledge of the grating geometry. Here, we present an investigation of the optical properties of dielectric gratings of sub-micron periodicity fabricated on a multilayer structure, which supports Bloch surface waves, by means of spectroscopic ellipsometry. Taking into account non-idealities, such as the finite spectral bandwidth, in the modeling process is shown to be a necessity for an accurate description of the observed spectra. The grating geometry determined from the analysis of ellipsometry data agrees very well with atomic force microscopy scans. Thus, our ellipsometric model is corroborated.