Tandem surface–plasma source: A new concept for a dc negative ion source-Reference-Cited by-同舟云学术

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Tandem surface–plasma source: A new concept for a dc negative ion source

Published:2002-02 Issue:2 Volume:73 Page:970-972
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Dimov G. I.

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1432468

Reference11 articles.

1. Multicusp negative ion source

2. Optimization of H− production from a small multicusp ion source

3. Cesium mixing in the multi-ampere volume H− ion source

4. Surface production of negative hydrogen ions

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A small radius hydrogen discharge: An effective source of volume produced negative ions;Journal of Applied Physics;2010-04-15

2. Plasma potential distribution in tandem surface-plasma source of negative ions;Technical Physics Letters;2010-03

3. Ion beams and their applications in high-resolution probe formation;IEEE Transactions on Plasma Science;2005-12

4. Bound state properties and astrophysical applications of negatively charged hydrogen ions;The Journal of Chemical Physics;2003-08-08

5. Ground bound state in the fully adiabatic∞H2+ion;Physical Review A;2003-06-11

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