Photochemical vapor deposition of hydrogenated amorphous silicon films from hydrogen diluted monosilane
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337705
Reference16 articles.
1. Laser generated microstructures
2. Surface characterization of photodeposited silicon/germanium alloy films
3. Optical and electrical properties of amorphous silicon films prepared by photochemical vapor deposition
4. Silicon Thin-Film Formation by Direct Photochemical Decomposition of Disilane
5. Photochemical vapor deposition of undoped andn‐type amorphous silicon films produced from disilane
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Comparison of the processes induced by nitrogen dilution on the photodissociation of silane and disilane at 193 nm;Journal of Photochemistry and Photobiology A: Chemistry;2002-07
2. Contributions of Silicon-Hydride Radicals to Hydrogenated Amorphous Silicon Film Formation in Windowless Photochemical Vapor Deposition System;Japanese Journal of Applied Physics;1994-02-15
3. References;Thin Films by Chemical Vapour Deposition;1990
4. Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm;Applied Surface Science;1989-12
5. ArF laser CVD of hydrogenated amorphous silicon: The role of buffer gases;Applied Physics A Solids and Surfaces;1989-05
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