LaF3insulators for MIS structures
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.90649
Reference8 articles.
1. Transport Properties of LaF3
2. Transport Properties of LaF3
3. A Solid-State Electrode for Reducible Gases
4. A Solid-State Electrode for Reducible Gases
5. On the interpretation of electrical measurements on the GaAs-MOS system
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2. Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors;Chemical Vapor Deposition;2008-04
3. Photoemission study of the growth of the NdF3/Si(111) interface;Applied Physics A Solids and Surfaces;1994-10
4. Photoemission study of the growth of the LaF3/Si (111) interface;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-03
5. A comparative study of the electrical properties of epitaxial fluorides;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1988-05
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