Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasma
Author:
Affiliation:
1. Department of Electrical Engineering, Hanyang University, Seoul 133-791, South Korea
2. Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, South Korea
Funder
National Research Foundation of Korea
Ministry of Trade, Industry and Energy
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0010018
Reference51 articles.
1. Introduction to gas discharges
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