Nanofibrous thin film with tuned optical properties induced by picosecond plasma ionization-Reference-Cited by-同舟云学术

Nanofibrous thin film with tuned optical properties induced by picosecond plasma ionization

Published:2020-01-31 Issue:4 Volume:127 Page:045303
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Shurtleff Olivia¹,Gaspari Franco²^ORCID,Kiani Amirkianoosh¹^ORCID

Affiliation:

1. Silicon Hall: Micro/Nano Manufacturing Facility, Faculty of Engineering and Applied Science, Ontario Tech University, 2000 Simcoe St N, Oshawa, Ontario, Canada

2. Faculty of Science, Ontario Tech University, 2000 Simcoe St N, Oshawa, Ontario L1G0C5, Canada

Funder

Natural Sciences and Engineering Research Council of Canada

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5134470

Reference19 articles.

1. Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications

2. Pulsed ionized mesh-like assembly of hybrid silica nanostructures with controlled resistivity

3. Synthesis of Silicon Nano-fibrous (SiNf) thin film with controlled thickness and electrical resistivity

4. Nanofiber technology: current status and emerging developments

5. Nano structured sensing surface: Significance in sensor fabrication

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