Excitonic processes and lasing in ZnO thin films and micro/nanostructures

Abstract

Low dimensional ZnO-based materials have drawn much attention for the past few decades due to their unique electronic and optical properties and potential applications in optoelectronic devices. In this Tutorial, we will cover the past and the latest developments in ZnO thin films and micro/nanostructures in terms of excitonic and related lasing processes. First, we give a brief overview of structural and band properties of ZnO along with the linear optical and excitonic properties. Second, we introduce a feedback mechanism for lasing in various forms of ZnO, ranging from nanoparticles to nanowires, nanodisks, and thin films. As for the feedback mechanism, detailed descriptions are given to random lasing, Fabry–Pérot lasing, and whispering gallery mode lasing. Third, we discuss possible gain mechanisms, i.e., excitonic gain and electron–hole plasma (EHP) gain, in ZnO. A special interest is also devoted to the Mott carrier density, which is a crucial parameter to distinguish between excitonic and EHP contributions to lasing. Lastly, recent developments on exciton–polariton lasers based on ZnO microcavities are introduced.