Pulsed KrF laser annealing of Ni/Si0.76Ge0.24 films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365683
Reference25 articles.
1. Normal‐incidence strained‐layer superlattice Ge0.5Si0.5/Si photodiodes near 1.3 μm
2. Ultrathin SimGenstrained layer superlattices-a step towards Si optoelectronics
3. Interfacial Reaction Between Ni and MBE‐Grown SiGe Alloy
4. Thermal reaction between Pt thin films and SixGe1−xalloys
5. Interfacial reactions and Schottky barriers of Pt and Pd on epitaxial Si1−xGexalloys
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