Threshold power density measurements for electron‐beam sustained discharge excitation of XeF and KrF-Reference-Cited by-同舟云学术

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Threshold power density measurements for electron‐beam sustained discharge excitation of XeF and KrF

Published:1977-07-15 Issue:2 Volume:31 Page:106-108
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Fisher Charles H.,Center Robert E.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.89604

Reference5 articles.

1. Attachment‐dominated electron‐beam‐ionized discharges

2. Electron‐beam‐controlled discharge pumping of the KrF laser

3. Electron‐beam‐controlled discharge pumping of the XeF laser

4. Kinetic model of the XeBr rare‐gas monohalide excimer laser

5. Hole injection and transport in SiO2 films on Si

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Rare gas halogen excimers;Topics in Applied Physics;1994

2. Exciplex lasers;Journal of Soviet Laser Research;1982

3. Efficient XeF laser excited by a proton beam;Applied Physics Letters;1979-07-15

4. Electrical characteristics of an E-beam controlled KrF<sup>*</sup>discharge;IEEE Journal of Quantum Electronics;1979-05

5. Rare Gas Halogen Excimers;Topics in Applied Physics;1979

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