Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering-Reference-Cited by-同舟云学术

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Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering

Published:2007-07-15 Issue:2 Volume:102 Page:024901
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Wang Chengqing,Jones Ronald L.,Lin Eric K.,Wu Wen-Li,Rice Bryan J.,Choi Kwang-Woo,Thompson George,Weigand Steven J.,Keane Denis T.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2753588

Reference9 articles.

1. Redefining critical in critical dimension metrology

2. Accuracy in CD-SEM metrology

3. Multiparameter grating metrology using optical scatterometry

4. Small angle x-ray scattering for sub-100 nm pattern characterization

5. Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings

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2. The intensity enhancement of transmission small angle x-ray scattering from nanostructures with a high aspect ratio;Surface Topography: Metrology and Properties;2023-06-01

3. Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and Technology;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-04-03

4. Characterization of deep-hole structure of semiconductor devices using transmission small-angle X-ray scattering;Japanese Journal of Applied Physics;2023-04-01

5. Inline metrology of high aspect ratio hole tilt and center line shift using small-angle x-ray scattering;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-03-22

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