Local lateral integration of 16-nm thick Ge nanowires on silicon on insulator substrates
Author:
Affiliation:
1. Univ. Grenoble Alpes, CEA, LETI, 38000 Grenoble, France
Funder
CEA-LETI
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5034205
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1. III–V compound semiconductor transistors—from planar to nanowire structures
2. Turning the undesired voids in silicon into a tool: In-situ fabrication of free-standing 3C-SiC membranes
3. Analysis of enhanced light emission from highly strained germanium microbridges
4. Polar-on-nonpolar epitaxy
5. Direct insight into grains formation in Si layers grown on 3C-SiC by chemical vapor deposition
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