Quantitative ion beam process for the deposition of compound thin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.94414
Reference5 articles.
1. Reactive film preparation
2. Combined ion beam deposition and etching for thin film studies
3. Technology and applications of broad‐beam ion sources used in sputtering. Part I. Ion source technology
4. Technology and applications of broad‐beam ion sources used in sputtering. Part II. Applications
5. Nitride film deposition by reactive ion beam sputtering
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