Ion sources for microfabrication (invited)
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1144986
Reference17 articles.
1. A high-performance 0.5- mu m BiCMOS technology for fast 4-Mb SRAMs
2. Advanced cell structures for dynamic RAMs
3. A quarter-micrometer interconnection technology using a TiN/Al-Si-Cu/TiN/Al-Si-Cu/TiN/Ti multilayer structure
4. Anisotropic highly selective electron cyclotron resonance plasma etching of polysilicon
5. Electrical and structural changes in the near surface of reactively ion etched InP
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