Self-contained in-vacuum in situ thin film stress measurement tool
Author:
Affiliation:
1. Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522NB Enschede, The Netherlands
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5021790
Reference22 articles.
1. Silicide-induced stress in Si: origin and consequences for MOS technologies
2. Effect of intrinsic stress on the optical properties of nanostructured ZnO thin films grown by rf magnetron sputtering
3. Microstructural design of hard coatings
4. Stress measurements in thermal loaded (Ti,Al)N hard coatings
5. Residual stress and mechanical property measurements in amorphous Si photovoltaic thin films
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2. Simultaneous Wireless Power and Data Transmission Over One Pair of Coils for Sensor-Integrated Rotating Cutter;IEEE Access;2020
3. In-situ studies of silicide formation during growth of molybdenum-silicon interfaces;Journal of Applied Physics;2019-10-07
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