Study on re-sputtering during CNx film deposition through spectroscopic diagnostics of plasma-Reference-Cited by-同舟云学术

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Study on re-sputtering during CNx film deposition through spectroscopic diagnostics of plasma

Published:2015-10 Issue:10 Volume:22 Page:103504
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Liang Peipei¹,Yang Xu¹,Li Hui¹,Cai Hua¹,Sun Jian¹²^ORCID,Xu Ning¹²,Wu Jiada¹²³

Affiliation:

1. Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China

2. Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433, China

3. Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Fudan University, Shanghai 200433, China

Funder

Doctoral Fund of Ministry of Education of China

National Natural Science Foundation of China (NSFC)

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4932326

Reference27 articles.

1. Preparation of Y‐Ba‐Cu oxide superconductor thin films using pulsed laser evaporation from highTcbulk material

2. Characterization of laser vaporization plasmas generated for the deposition of diamond‐like carbon

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma Emission Spectroscopy to Study the Resputtering Produced by Pulsed Laser Deposition of Au and in Combination With Magnetron Sputtering of ZnO;IEEE Transactions on Plasma Science;2021-07

2. Colorful carbon nitride based composite films;Applied Surface Science;2020-05

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