Each dopant can absorb more than ten photons: Transient absorbance measurement at excitation laser wavelength in polymer ablation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111596
Reference10 articles.
1. Self‐developing UV photoresist using excimer laser exposure
2. Direct etching of polymeric materials using a XeCl laser
3. Femtosecond uv excimer laser ablation
4. Fluence‐dependent transmission of polyimide at 248 nm under laser ablation conditions
5. Ultraviolet laser ablation of polyimide films
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