Improving the dielectric properties of an electrowetting-on-dielectric microfluidic device with a low-pressure chemical vapor deposited Si3N4 dielectric layer-Reference-Cited by-同舟云学术

Improving the dielectric properties of an electrowetting-on-dielectric microfluidic device with a low-pressure chemical vapor deposited Si3N4 dielectric layer

Published:2015-03 Issue:2 Volume:9 Page:022403
ISSN:1932-1058
Container-title:Biomicrofluidics
language:en
Short-container-title:Biomicrofluidics

Author:

Shen Hsien-Hua¹,Chung Lung-Yuan¹,Yao Da-Jeng¹²^ORCID

Affiliation:

1. Institute of NanoEngineering and MicroSystems, National Tsing Hua University, Hsinchu 30013, Taiwan

2. Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan

Funder

National Science Council, Taiwan

Publisher

AIP Publishing

Subject

Condensed Matter Physics,General Materials Science,Fluid Flow and Transfer Processes,Colloid and Surface Chemistry,Biomedical Engineering

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4915613

Reference34 articles.

1. Electrowetting and electrowetting-on-dielectric for microscale liquid handling

2. Droplet Actuation by Electrowetting-on-Dielectric (EWOD): A Review

3. Creating, transporting, cutting, and merging liquid droplets by electrowetting-based actuation for digital microfluidic circuits

4. Addressable micro liquid handling by electric control of surface tension

5. A Reagent-Saving Mixing Algorithm for Preparing Multiple-Target Biochemical Samples Using Digital Microfluidics

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