Neutralization efficiency estimation in a neutral beam source based on inductively coupled plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2987475
Reference29 articles.
1. 50 nm gate electrode patterning using a neutral-beam etching system
2. Highly selective low-damage processes using advanced neutral beams for porous low-k films
3. Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source
4. Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beams
5. Study on the low-angle forward-reflected neutral beam etching system for SiO2 etching
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Numerical simulation on neutral beam generation mechanism by collision of positive and negative chlorine ions with graphite surface;Journal of Physics D: Applied Physics;2011-03-04
2. Simulation results for three neutralization channel designs of a fast neutral beam source;SPIE Proceedings;2009-10-23
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