1. Characterization of (Al, Si)N films deposited by balanced magnetron sputtering
2. V. P. Sergeev, M. V. Fedorishcheva, A. R. Sungatulin, A. V. Nikalin, and V. V. Neufeld, Bull. Tomsk Polytech. Univer. 319, 103–108 (2011).
3. V. P. Sergeev, V. P. Yanovsky, Yu. N. Paraev, S. A. Kozlov, and S. A. Zhuravlyov, Fiz. Mezomekh. 7, 333–336 (2004).
4. A. V. Gerasimov, S. V. Pashkov, Yu. F. Khristenko, J. Math. Mech. 16(4), 70–78 (2011).
5. R. A. Andrievsky and I. I. Spivak, Silicon Nitride Materials on the Basis Thereof Metallurgy (Moscow, 1984).