On the radial distribution and nonambipolarity of charged particle fluxes in a nonmagnetized planar inductively coupled plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.363786
Reference35 articles.
1. Novel radio‐frequency induction plasma processing techniques
2. Review of inductively coupled plasmas for plasma processing
3. Transformer coupled plasma etch technology for the fabrication of subhalf micron structures
4. Application of a high density inductively coupled plasma reactor to polysilicon etching
5. Gate oxide damage in a high density inductively coupled plasma
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