Selective area deposition of silicon‐nitride and silicon‐oxide by laser chemical vapor deposition and fabrication of microlenses
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.339324
Reference10 articles.
1. A review of laser–microchemical processing
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4. Selective Area Laser CVD of Silicon Nitride and Oxide and its Application to Microlenses
5. Distributed-index planar microlens
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1. References;Thin Film Micro-Optics;2007
2. Growth of Crystalline Silicon on a Cryogenic Substrate by Photochemical Reaction in a Condensed Phase;Japanese Journal of Applied Physics;1997-12-15
3. Theoretical study on the fabrication of a microlens using the excimer laser chemical vapor deposition technique;Thin Solid Films;1996-10
4. Resolution capabilities of photodeposited holographic gratings;Applied Surface Science;1994-05
5. Photo-induced chemical vapour deposition of silicon oxide thin films;Thin Solid Films;1992-10
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