Effect of mesh bias on the properties of the lateral conductivity of intrinsic microcrystalline silicon films deposited by low-frequency inductively coupled plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3662419
Reference13 articles.
1. Mechanism of hydrogen-induced crystallization of amorphous silicon
2. Assembly and characterization of colloid-based antireflective coatings on multicrystalline silicon solar cells
3. Influence of pressure and ion bombardment on the growth and properties of nanocrystalline silicon materials
4. Kinetics of the initial stage of silicon surface oxidation: Deal–Grove or surface nucleation?
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1. Pd-Based Membranes for Hydrogen Separation: Review of Alloying Elements and Their Influence on Membrane Properties;Separation & Purification Reviews;2016-08-11
2. Low ion energy RF reactor using an array of plasmas through a grounded grid;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-03
3. The fabrication and application of ZnO:Al thin films in low-frequency inductively coupled plasma fabricated silicon solar cell;Thin Solid Films;2012-09
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