A study of vanadium as diffusion barrier between aluminum and gadolinium silicide contacts
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.330030
Reference6 articles.
1. Contact reaction between Si and rare earth metals
2. Low Schottky barrier of rare‐earth silicide onn‐Si
3. Schottky contacts of Gd‐Pt and Gd‐V alloys onn‐Si andp‐Si
4. Parallel silicide contacts
5. Microstructure and Schottky barrier height of iridium silicides formed on silicon
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1. Au and non-Au based rare earth metal-silicide ohmic contacts to p-InGaAs;Solid-State Electronics;2011-07
2. Induced magnetism at interfaces in ultra-thin epitaxialV∕Gdbilayers;Physical Review B;2006-08-16
3. Modification of Al/Si interface and Schottky barrier height with chemical treatment;Applied Surface Science;2002-05
4. Passivation of Al/Si Interface by Chemical Treatment: Schottky Barrier Height and Plasma Etch Induced Defects;Solid State Phenomena;2001-11
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