Compensating for artifacts in scanning near-field optical microscopy due to electrostatics-Reference-Cited by-同舟云学术

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Compensating for artifacts in scanning near-field optical microscopy due to electrostatics

Published:2021-03-01 Issue:3 Volume:6 Page:036102
ISSN:2378-0967
Container-title:APL Photonics
language:en
Short-container-title:APL Photonics

Author:

Nörenberg Tobias¹²^ORCID,Wehmeier Lukas¹²^ORCID,Lang Denny³,Kehr Susanne C.¹^ORCID,Eng Lukas M.¹²^ORCID

Affiliation:

1. Institute of Applied Physics, Technische Universität Dresden, 01062 Dresden, Germany

2. ct.qmat: Würzburg-Dresden Cluster of Excellence - EXC 2147, Technische Universität Dresden, Dresden, Germany

3. Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany

Funder

Bundesministerium für Bildung und Forschung

Deutsche Forschungsgemeinschaft

Graduate Academy of the Technische Universität Dresden

Publisher

AIP Publishing

Subject

Computer Networks and Communications,Atomic and Molecular Physics, and Optics

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0031395

Reference65 articles.

1. Scanning plasmon near-field microscope

2. Near-field scanning optical microscope with a metallic probe tip

3. Apertureless near‐field optical microscope

4. Analytical model for quantitative prediction of material contrasts in scattering-type near-field optical microscopy

5. Material contrast in scanning near-field optical microscopy at 1–10 nm resolution

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