Development of compact microwave ion source for low-energy application
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1148583
Reference4 articles.
1. Film modification by low energy ion bombardment during deposition
2. Structures and properties of copper thin films prepared by ion beam assisted deposition
3. Axial magnetic field extraction‐type microwave ion source with a permanent magnet
4. Low temperature growth of A1n and Al2O3 films by the simultaneous use of a microwave ion source and an ionized cluster beam system
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1. Negative Ion Plasmas;Encyclopedia of Plasma Technology;2016-12-12
2. Emittance of compact microwave ion source for low energy application;Review of Scientific Instruments;2014-02
3. Characteristics of low-energy ion beams extracted from a wire electrode geometry;Review of Scientific Instruments;2012-02
4. Comparison between single- and dual-electrode ion source systems for low-energy ion transport;AIP Conference Proceedings;2012
5. Metal-free and gasless space charge compensation of low energy ion beam by using surface-carbonized silicon field emitter array;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-03
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