Surface mechanisms in O2and SF6microwave plasma etching of polymers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.344944
Reference23 articles.
1. Oxygen plasma etching for resist stripping and multilayer lithography
2. Etching mechanisms of polymers in oxygen microwave multipolar plasmas
3. The etching of polymers in oxygen‐based plasmas: A parametric study
4. Mechanistic studies of oxygen plasma etching
5. Sputtering Yield of Carbon Atoms in Organic Materials for Oxygen Bombardment
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