Influence of substrate temperature on the NiO thin films for p-NiO/n-Si UV-visible photodetector
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Publisher
AIP Publishing
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0001263
Reference12 articles.
1. Electrochromic properties of porous NiO thin films prepared by a chemical bath deposition
2. Effect of substrate temperature and oxygen partial pressure on RF sputtered NiO thin films
3. Pulsed laser deposition of plasmonic-metal nanostructures
4. Effect of the deposition parameters on the structural and magnetic properties of pulsed laser ablated NiO thin films
5. Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition
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1. ZnO hole blocking layer induced highly UV responsive p-NiO/n-ZnO/n-Si heterojunction photodiodes;Sensors and Actuators A: Physical;2023-01
2. Influence of Substrate temperature on the performance of Schottky photodetector based on Au/n-Si structure;JSAP-Optica Joint Symposia 2023 Abstracts;2023
3. Rapid fabrication of NiO/porous Si film for ultra-violate photodetector: The effect of laser energy;Microelectronic Engineering;2022-04
4. Laser ablation fabrication of a p-NiO/n-Si heterojunction for broadband and self-powered UV–Visible–NIR photodetection;Nanotechnology;2022-03-30
5. Broadband self-powered photodetection with p-NiO/n-Si heterojunctions enhanced with plasmonic Ag nanoparticles deposited with pulsed laser ablation;Journal of Materials Science: Materials in Electronics;2022-03-19
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