High-resolution photoelectron spectroscopy of Ge-based HfO2 gate stacks
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2435512
Reference15 articles.
1. Growth and Materials Characterization of Native Germanium Oxynitride Thin Films on Germanium
2. Plasma anodic oxidation and nitridation of Ge(111) surface
3. Deposition of HfO2 on germanium and the impact of surface pretreatments
4. Surface oxidation states of germanium
5. High resolution XPS study of oxide layers grown on Ge substrates
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